منابع مشابه
Automated Reticle Handling: a Comparison of Distributed and Centralized Reticle Storage and Transport
The implementation of Automated Material Handling Systems (AMHS) in 300mm semiconductor facilities provides the opportunity to realize significant benefits in fabricator productivity and performance. The leverage associated with automated reticle delivery to photolithography process tools may be less apparent than a fab-wide AMHS. However, a high product mix environment requires the tracking, s...
متن کاملMulti-Project Reticle Design and Wafer Dicing under Uncertain Demand∗
The pervasive use of advanced reticle enhancement technologies demanded by VLSI technology scaling leads to dramatic increases in mask costs. In response to this trend, multiple project wafers (MPW) have been proposed as an effective technique for sharing the cost of mask tooling among up to tens of prototype and low volume designs. Previous works on MPW reticle design and dicing have focused o...
متن کاملReticle Floorplanning with Guaranteed Yield for Multi-Project Wafers
With the dramatic increase in mask costs, multi-project wafers have became an attractive choice for low-volume chip fabrication. By using the same set of masks to fabricate a number of different chips, the mask-set cost is amortized among different chip providers, leading to significant cost reduction especially for chip prototyping. In this paper we present a new algorithm for reticle floorpla...
متن کاملData-driven Control Strategy for a Reticle Stage in a Lithographic Tool
where p is the controller parameter, J is the gradient, k is the iteration number, R is a positive definite matrix and γ is the step size. In this paper, a data-driven control strategy is proposed to synthetically build the control system of a 6-DOF ultra-precision dual-stroke stage. The stage, namely reticle stage which is a critical lithographic component, moves the pattern in synchronizatio...
متن کاملA Defect-to-Yield Correlation Study for Marginally Printing Reticle Defects
25 This paper presents a defect-to-yield correlation for marginally printing defects in a gate and a contact 4X DUV reticle by describing their respective impact on the lithography manufacturing process window of a 16 MB Flash memory device. The study includes site-dependent sort yield signature analysis within the exposure field, followed by electrical bitmap and wafer strip back for the lower...
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ژورنال
عنوان ژورنال: Monthly Notices of the Royal Astronomical Society
سال: 1902
ISSN: 0035-8711,1365-2966
DOI: 10.1093/mnras/62.8.580